Sensor assembly for determining fluid properties in a subsurface well

ABSTRACT

A sensor assembly ( 51 ) for sensing one or more fluid properties of a fluid in a subsurface well ( 12 ) having a well fluid level ( 42 W), a surface region ( 32 ) and a riser pipe ( 30 ) includes a sensor apparatus ( 52 ) and a pump assembly ( 54 ) that are positioned within the well ( 12 ). The sensor apparatus ( 52 ) includes a sensor ( 682 ) that senses one of the fluid properties. The pump assembly ( 54 ) can be positioned in an in-line manner relative to the sensor apparatus ( 52 ). The pump assembly ( 54 ) can be positioned between the sensor apparatus ( 52 ) and the surface region ( 32 ). Alternatively, the sensor apparatus ( 52 ) can be positioned between the pump assembly ( 54 ) and the surface region ( 32 ). In one embodiment, the sensor apparatus ( 52 ) is positioned above the well fluid level ( 42 W). The pump assembly ( 54 ) can pump fluid toward the sensor apparatus ( 52 ) or the pump assembly ( 54 ) can pump fluid to draw more fluid to the sensor apparatus ( 52 ). The pump assembly ( 54 ) can be a two-line, two-valve pump that is removable from the riser pipe ( 30 ). The sensor assembly ( 51 ) can include a controller ( 17 ) that receives data from the sensor ( 682 ) regarding one of the fluid properties of the fluid.

RELATED APPLICATIONS

The present application is a continuation application and claims thebenefit under 35 U.S.C. 120 on co-pending U.S. patent application Ser.No. 11/651,649, filed on Jan. 9, 2007. Additionally, the presentapplication further claims the benefit on U.S. Provisional ApplicationSer. No. 60/758,030 filed on Jan. 11, 2006, and on U.S. ProvisionalApplication Ser. No. 60/765,249 filed on Feb. 3, 2006. The contents ofU.S. patent application Ser. No. 11/651,649, and U.S. ProvisionalApplication Ser. Nos. 60/758,030 and 60/765,249 are incorporated hereinby reference.

BACKGROUND

Subsurface wells for extracting and/or testing fluid (liquid or gas)samples on land and at sea have been used for many years. Manystructures have been developed in an attempt to isolate the fluid from aparticular depth in a well so that more accurate in situ or remotelaboratory testing of the fluid at that depth “below ground surface”(bgs) can be performed. Unfortunately, attempts to accurately andcost-effectively accomplish this objective have been not altogethersatisfactory.

For example, typical wells include riser pipes having relatively largediameters, i.e. 2-4 inches, or greater. Many such wells can have depthsthat extend hundreds or even thousands of feet bgs. In order toaccurately remove a fluid sample for testing from a particular targetzone within a well, such as a sample at 1,000 feet bgs, typical wellscan require that the fluid above the target zone be removed at leastonce and more commonly 3 to 5 times this volume in order to obtain amore representative fluid sample from the desired level. From avolumetric standpoint, traditional wet casing volumes of 2-inch and4-inch monitoring wells are 0.63 liters (630 ml) to 2.5 liters (2,500ml) per foot, respectively. As an example, to obtain a sample at 1,000feet bgs, approximately 630 liters to 2,500 liters of fluid must bepurged from the well at least once and more commonly 3 to 5 times thisvolume. The time required and costs associated with extracting thisfluid from the well can be rather significant.

One method of purging fluid from the well and/or obtaining a fluidsample includes using coaxial gas displacement within the riser pipe ofthe well. Unfortunately, this method can have several drawbacks. First,gas consumption during pressurization of these types of systems can berelatively substantial because of the relatively large diameter andlength of riser pipe that must be pressurized. Second, introducing largevolumes of gas into the riser pipe can potentially have adverse effectson the volatile organic compounds (VOC's) being measured in the fluidsample that is not collected properly. Third, a pressure sensor that maybe present within the riser pipe of a typical well is subjected torepeated pressure changes from the coaxial gas displacementpressurization of the riser pipe. Over time, this artificially createdrange of pressures in the riser pipe may have a negative impact on theaccuracy of the pressure measurements from the sensor. Fourth, residualgas pressure can potentially damage one or more sensors and/or alterreadings from the sensors once substantially all of the fluid has passedthrough the sample collection line past the sensors. Fifth, any leaks inthe system can cause gas to be forcibly infused into the groundformation, which can influence the results of future sample collections.

Another method for purging fluid from these types of wells includes theuse of a bladder pump. Bladder pumps include a bladder thatalternatingly fills and empties with a gas to force movement of thefluid within a pump system. However, the bladders inside these pumps canbe susceptible to leakage due to becoming fatigued or detached duringpressurization. Further, the initial cost as well as maintenance andrepair of bladder pumps can be relatively expensive. In addition, atcertain depths, bladder pumps require an equilibration period duringpressurization to decrease the likelihood of damage to or failure of thepump system. This equilibration period can result in a slower overallpurging process, which decreases efficiency.

An additional method for purging fluid from a well includes using anelectric submersible pump system having an electric motor. This type ofsystem can be susceptible to electrical shorts and/or burning out of theelectric motor. Additionally, this type of pump typically uses one ormore impellers that can cause pressure differentials (e.g., drops),which can result in VOC loss from the sample being collected. Operationof these types of electric pumps can also raise the temperature of thegroundwater, which can also impact VOC loss. Moreover, these pumps canbe relatively costly and somewhat more difficult to repair and maintain.

Further, the means for physically isolating a particular zone of thewell from the rest of the well can have several shortcomings. Forinstance, inflatable packers are commonly used to isolate the fluid froma particular zone either above or below the packer. However, these typesof packers can be subject to leakage, and can be cumbersome andrelatively expensive. In addition, these packers are susceptible torupturing, which can potentially damage the well.

SUMMARY

The present invention is directed toward a sensor assembly for sensingone or more fluid properties of a fluid in a subsurface well. One of thefluid properties can be selected from the group consisting of anelectrical property, an optical property, an acoustical property, achemical property and a hydraulic property. The subsurface well has awell fluid level, a surface region and a riser pipe that extends in adownwardly direction from the surface region. In certain embodiments,the sensor assembly includes a sensor apparatus and a pump assembly. Thesensor apparatus is positioned within the subsurface well, and includesa sensor that senses one of the fluid properties of the fluid.

The pump assembly is coupled to the sensor apparatus. The pump assemblycan be positioned within the subsurface well in an in-line mannerrelative to the sensor apparatus. In one embodiment, the pump assemblycan pump fluid toward the sensor apparatus. In an alternativeembodiment, the pump assembly can pump fluid in order to draw more fluidto the sensor apparatus so that the sensor can sense one or more of thefluid properties of the fluid. In various embodiments, the pump assemblyis removable from the riser pipe of the subsurface well. Further, thepump assembly can include a two-line, two-valve pump.

In certain embodiments, the pump assembly is positioned substantiallybetween the sensor apparatus and the surface region. In one suchembodiment, at least a portion of the pump assembly is positioned belowthe well fluid level within the subsurface well. In alternativeembodiments, the sensor apparatus can be positioned between the pumpassembly and the surface region of the subsurface well. In theseembodiments, the pump assembly is adapted to pump fluid to the sensorapparatus. In one such embodiment, the sensor apparatus can bepositioned above the well fluid level within the subsurface well.

In another embodiment, the sensor assembly also includes a controllerthat receives data from the sensor regarding one of the fluid propertiesof the fluid. The data can be transmitted to the controller while thesensor is positioned within the subsurface well.

The present invention is also directed toward a method for sensing oneor more fluid properties from a fluid within a subsurface well.

BRIEF DESCRIPTION OF THE DRAWINGS

The novel features of this invention, as well as the invention itself,both as to its structure and its operation, will be best understood fromthe accompanying drawings, taken in conjunction with the accompanyingdescription, in which similar reference characters refer to similarparts, and in which;

FIG. 1 is a cross-sectional view of one embodiment of a fluid monitoringsystem having features of the present invention, including oneembodiment of a zone isolation assembly;

FIG. 2 is a cross-sectional view of a portion of one embodiment of aportion of the subsurface well, including a portion of a fluid inletstructure, a portion of a riser pipe and a docking receiver;

FIG. 3 is a schematic view of another embodiment of the fluid monitoringsystem;

FIG. 4 is a schematic view of a portion of yet another embodiment of thefluid monitoring system including a pump assembly;

FIG. 5 is a schematic view of a portion of still another embodiment ofthe fluid monitoring system;

FIG. 6 is a cross-sectional view of a portion of the fluid monitoringsystem taken on line 6-6 in FIG. 5;

FIG. 7 is a cross-sectional view of another embodiment of a portion of afluid monitoring system; and

FIG. 8 is a schematic view of a portion of still another embodiment ofthe fluid monitoring system.

DESCRIPTION

FIG. 1 is a schematic view of one embodiment of a fluid monitoringsystem 10 for monitoring or sensing one or more parameters of subsurfacefluid from an adjacent environment 11. As used herein, the term“environment” can include naturally occurring or artificial (manmade)environments 11 of either solid or liquid materials. As non-exclusiveexamples, the environment 11 can include a ground formation of soil,rock or any other types of solid formations, or the environment 11 caninclude a portion of a body of water (ocean, lake, river, etc.) or otherliquid regions.

Monitoring the fluid in accordance with the present invention can beperformed in situ or following removal of the fluid from its native ormanmade environment 11. As used herein, the term “monitoring” or“sensing” can include a one-time measurement of a single parameter ofthe fluid, multiple or ongoing measurements of a single parameter of thefluid, a one-time measurement of multiple parameters of the fluid, ormultiple or ongoing measurements of multiple parameters of the fluid.Further, it is recognized that subsurface fluid can be in the form of aliquid and/or a gas. In addition, the Figures provided herein are not toscale given the extreme heights of the fluid monitoring systems relativeto their widths.

The fluid monitoring system 10 illustrated in FIG. 1 can include asubsurface well 12, a gas source 14, a gas inlet line 16, a controller17, a fluid receiver 18, a fluid outlet line 20 and a zone isolationassembly 22. In this embodiment, the subsurface well 12 (also sometimesreferred to herein simply as “well”) can include one or more layers ofannular materials 24A, 24B, 24C, a first zone 26, a second zone 28, afluid inlet structure 29, and/or a riser pipe 30. It is understood thatalthough the fluid monitoring systems 10 described herein areparticularly suited to be installed in the ground, various embodimentsof the fluid monitoring systems 10 are equally suitable for installationand use in a body of water, or in a combination of both ground andwater, and that no limitations are intended in any manner in thisregard.

The subsurface well 12 can be installed using any one of a number ofmethods known to those skilled in the art. In non-exclusive, alternativeexamples, the well 12 can be installed with hollow stem auger, sonic,air rotary casing hammer, dual wall percussion, dual tube, rotarydrilling, vibratory direct push, cone penetrometer, cryogenic,ultrasonic and laser methods, or any other suitable method known tothose skilled in the art of drilling and/or well placement. The wells 12described herein include a surface region 32 and a subsurface region 34.The surface region 32 is an area that includes the top of the well 12which extends to a surface 36. Stated another way, the surface region 32includes the portion of the well 12 that extends between the surface 36and the top of the riser pipe 30, whether the top of the riser pipe 30is positioned above or below the surface 36. The surface 36 can eitherbe a ground surface or the surface of a body of water or other liquid,as non-exclusive examples. The subsurface region 34 is the portion ofthe well 12 that is below the surface region 32, e.g., at a greaterdepth than the surface region 34.

The annular materials 24A-C can include a first layer 24A (illustratedby dots) that is positioned at or near the first zone 26, and a secondlayer 24B (illustrated by dashes) that is positioned at or near thesecond zone 28. The annular materials are typically positioned in layers24A-C during installation of the well 12. It is recognized that althoughthree layers 24A-C are included in the embodiment illustrated in FIG. 1,greater or fewer than three layers 24A-C of annular materials can beused in a given well 12.

In one embodiment, for example, the first layer 24A can be sand or anyother suitably permeable material that allows fluid to move from thesurrounding ground environment 11 to the fluid inlet structure 29 of thewell 12. The second layer 24B is positioned above the first layer 24A.The second layer 24B can be formed from a relatively impermeable layerthat inhibits migration of fluid from the environment 11 near the fluidinlet structure 29 and the first zone 26 to the riser pipe 30 and thesecond zone 28. For example, the second layer 24B can include abentonite material or any other suitable material of relativeimpermeability. In this embodiment, the second layer 28 helps increasethe likelihood that the fluid collected through the fluid inletstructure 29 of the well 12 is more representative of the fluid from theenvironment 11 adjacent to the fluid inlet structure 29. The third layer24C is positioned above the second layer 24B and can be formed from anysuitable material, such as backfilled grout, bentonite, volclay and/ornative soil, as one non-exclusive example. The third layer 24C ispositioned away from the first layer 24A to the extent that thelikelihood of fluid migrating from the environment 11 near the thirdlayer 24C down to the fluid inlet structure 29 is reduced or prevented.

As used herein, the first zone 26 is a target zone from which aparticular fluid sample is desired to be taken and/or monitored.Further, the second zone 28 can include fluid that is desired to beexcluded from the fluid sample to be removed from the well 12 and/ortested, and is adjacent to the first zone 26. In the embodimentsprovided herein, the first zone 26 is positioned either directly beneathor at an angle below the second zone 28 such that the first zone 26 isfurther from the surface 36 of the surface region 32 than the secondzone 28.

In each well 12, the first zone 26 has a first volume and the secondzone 28 has a second volume. In certain embodiments, the second volumeis substantially greater than the first volume because the height of thesecond zone 28 can be substantially greater than a height of the firstzone 26. For example, the height of the first zone 26 can be on theorder of between several inches to approximately five or ten feet. Incontrast, the height of the second zone 28 can be from several feet upto several hundreds or thousands of feet. Assuming somewhat similarinner dimensions of the first zone 26 and the second zone 28, the secondvolume can be from 100% to 100,000% greater than the first volume. Asone non-exclusive example, in a 1-inch inner diameter well 12 having adepth of 1,000 feet, with the first zone 26 positioned at the bottom ofthe well 12, the first zone having a height of approximately five feet,the second zone 28 would have a height of approximately 995 feet. Thus,the first volume would be approximately 47 in³, while the second volumewould be approximately 9,378 in³, or approximately 19,800% greater thanthe first volume.

For ease in understanding, the first zone 26 includes a first fluid 38(illustrated with X's), and the second zone 28 includes a second fluid40 (illustrated with O's). The first fluid 38 and the second fluid 40migrate as a single fluid to the well 12 through the environment 11outside of the fluid inlet structure 29. In this embodiment, a wellfluid level 42W in the well 12 is the top of the second fluid 40, which,at equilibrium, is approximately equal to an environmental fluid level42E in the environment 11, although it is acknowledged that somedifferences between the well fluid level 42W and the environmental fluidlevel 42E can occur. During equilibration of the fluid levels 42W, 42E,the fluid rises in the first zone 26 and the second zone 28 of the well12. Due to gravitational forces and/or other influences, the fluid nearan upper portion (e.g., in the second zone 28) of the well 12 will havea different composition from the fluid near a lower portion (e.g., inthe first zone 26) of the well 12. Thus, although the first fluid 38 andthe second fluid 40 can originate from a somewhat similar locationwithin the environment 11, the first fluid 38 and the second fluid 40can ultimately have different compositions at a point in time afterentering the well 12, based on the relative positions of the fluids 38,40 within the well 12.

The first fluid 38 is the liquid or gas that is desired for monitoringand/or testing. In this and other embodiments, it is desirable toinhibit mixing or otherwise commingling of the first fluid 38 and thesecond fluid 40 before monitoring and/or testing the first fluid 38. Asdescribed in greater detail below, the first fluid 38 and the secondfluid 40 can be effectively isolated from one another utilizing the zoneisolation assembly 22.

The fluid inlet structure 29 allows fluid from the first layer 24Aoutside the first zone 26 to migrate into the first zone 26. The designof the fluid inlet structure 29 can vary. For example, the fluid inletstructure 29 can have a substantially tubular configuration or anothersuitable geometry. Further, the fluid inlet structure 29 can beperforated, slotted, screened or can have some other alternativeopenings or pores (not shown) that allow fluid and/or variousparticulates to enter into the first zone 26. The fluid inlet structure29 can include an end cap 31 at the lowermost end of the fluid inletstructure 29 that inhibits material from the first layer 24A fromentering the first zone 26.

The fluid inlet structure 29 has a length 43 that can vary dependingupon the design requirements of the well 12 and the subsurfacemonitoring system 10. For example, the length 43 of the fluid inletstructure 29 can be from a few inches to several feet or more.

The riser pipe 30 is a hollow, cylindrically-shaped structure. The riserpipe 30 can be formed from any suitable materials. In one non-exclusiveembodiment, the riser pipe 30 can be formed from a polyvinylchloride(PVC) material and can be any desired thickness, such as Schedule 80,Schedule 40, etc. Alternatively, the riser pipe 30 can be formed fromother plastics, fiberglass, ceramic, metal, etc. The length (orientedsubstantially vertically in FIG. 1) of the riser pipe 30 can varydepending upon the requirements of the system 10. For example, thelength of the riser pipe 30 can be within the range of a few feet tothousands of feet, as necessary. It is recognized that although theriser pipe 30 illustrated in the Figures is illustrated substantiallyvertically, the riser pipe 30 and other structures of the well 12 can bepositioned at any suitable angle from vertical.

The inner diameter 44 of the riser pipe 30 can vary depending upon thedesign requirements of the well 12 and the fluid monitoring system 10.In one embodiment, the inner diameter 44 of the riser pipe 30 is lessthan approximately 2.0 inches. For example, the inner diameter 44 of theriser pipe 30 can be approximately 1.85 inches. In non-exclusivealternative embodiments, the inner diameter 44 of the riser pipe 30 canbe approximately 1.40 inches, 0.90 inches, 0.68 inches, or any othersuitable dimension. In still other embodiments, the inner diameter 44 ofthe riser pipe 30 can be greater than 2.0 inches.

The gas source 14 includes a gas 46 (illustrated with small triangles)that is used to move the first fluid 38 as provided in greater detailbelow. The gas 46 used can vary. For example, the gas 46 can includenitrogen, argon, oxygen, helium, air, hydrogen, or any other suitablegas. In one embodiment, the flow of the gas 46 can be regulated by thecontroller 17, which can be manually or automatically operated andcontrolled, as needed.

The gas inlet line 16 is a substantially tubular line that directs thegas 46 to the well 12 or to various structures and/or locations withinthe well 12, as described in greater detail below.

The controller 17 can control or regulate various processes related tofluid monitoring. For example, the controller 17 can adjust and/orcontrol timing of the gas delivery to various structures within the well12. Additionally, or alternatively, the controller 17 can adjust and/orregulate the volume of gas 46 that is delivered to the variousstructures within the well 12. In still other embodiments, thecontroller 17 can receive and/or analyze data that is transmitted to thecontroller 17 by other structures in the well 12, as described ingreater detail below. For example, the controller can analyze datarelating to the fluid properties of the fluid being analyzed and/orsampled in the well 12. In one embodiment, the controller 17 can includea computerized system. It is recognized that the positioning of thecontroller 17 within the fluid monitoring system 10 can be varieddepending upon the specific processes being controlled by the controller17. In other words, the positioning of the controller 17 illustrated inFIG. 1 is not intended to be limiting in any manner.

The fluid receiver 18 receives the first fluid 38 from the first zone 26of the well 12. Once received, the first fluid 38 can be monitored,sensed and/or tested by methods known by those skilled in the art.Alternatively, the first fluid 38 can be monitored, sensed and/or testedprior to being received by the fluid receiver 18. The first fluid 38 istransferred to the fluid receiver 18 via the fluid outlet line 20.Alternatively, the fluid receiver 18 can receive a different fluid fromanother portion of the well 12.

The zone isolation assembly 22 selectively isolates the first fluid 38in the first zone 26 from the second fluid 40 in the second zone 28. Thedesign of the zone isolation assembly 22 can vary to suit the designrequirements of the well 12 and the fluid monitoring system 10. In theembodiment illustrated in FIG. 1, the one isolation assembly 22 includesa docking receiver 48, a docking apparatus 50 and a sensor assembly 51.

In the embodiment illustrated in FIG. 1, the docking receiver 48 isfixedly secured to the fluid inlet structure 29 and the riser pipe 30.In various embodiments, the docking receiver 48 is positioned betweenand threadedly secured to the fluid inlet structure 29 and the riserpipe 30. In non-exclusive alternative embodiments, the docking receiver48 can be secured to the fluid inlet structure 29 and/or the riser pipe30 in other suitable ways, such as by an adhesive material, welding,fasteners, or by integrally forming or molding the docking receiver 48with one or both of the fluid inlet structure 29 and at least a portionof the riser pipe 30. Stated another way, the docking receiver 48 can beformed unitarily with the fluid inlet structure 29 and/or at least aportion of the riser pipe 30.

In certain embodiments, the docking receiver 48 is at least partiallypositioned at the uppermost portion of the first zone 26. In otherwords, a portion of the first zone 26 is at least partially bounded bythe docking receiver 48. Further, the docking receiver 48 can also bepositioned at the lowermost portion of the second zone 28. In thisembodiment, a portion of the second zone 28 is at least partiallybounded by the docking receiver 48.

The docking apparatus 50 selectively docks with the docking receiver 48to form a substantially fluid-tight seal between the docking apparatus50 and the docking receiver 48. The design and configuration of thedocking apparatus 50 as provided herein can be varied to suit the designrequirements of the docking receiver 48. In various embodiments, thedocking apparatus 50 moves from a disengaged position wherein thedocking apparatus 50 is not docked with the docking receiver 48, to anengaged position wherein the docking apparatus 50 is docked with thedocking receiver 48.

In the disengaged position, the first fluid 38 and the second fluid 40are not isolated from one another. In other words, the first zone 26 andthe second zone 28 are in fluid communication with one another. In theengaged position (illustrated in FIG. 1), the first fluid 38 and thesecond fluid 40 are isolated from one another. Stated another way, inthe engaged position, the first zone 26 and the second zone 28 are notin fluid communication with one another.

The docking apparatus 50 includes a docking weight 56, a resilient seal58 and a fluid channel 60. In various embodiments, the docking weight 56has a specific gravity that is greater than water. In non-exclusivealternative embodiments, the docking weight 56 can be formed frommaterials so that the docking apparatus has an overall specific gravitythat is at least approximately 1.50, 2.00, 2.50, 3.00, or 3.50. Incertain embodiments, the docking weight 56 can be formed from materialssuch as metal, ceramic, epoxy resin, rubber, Viton, Nylon, Nitrile,Teflon, glass, plastic or other suitable materials having the desiredspecific gravity characteristics.

In various embodiments, the resilient seal 58 is positioned around acircumference of the docking weight 56. The resilient seal 58 can beformed from any resilient material such as rubber, urethane or otherplastics, certain epoxies, or any other material that can form asubstantially fluid-tight seal with the docking receiver 48. In onenon-exclusive embodiment, for example, the resilient seal 58 is arubberized O-ring. In this embodiment, because the resilient seal 58 isin the form of an O-ring, a relatively small surface area of contactbetween the resilient seal 58 and the docking receiver 48 occurs. As aresult, a higher force in pounds per square inch (psi) is achieved. Forexample, a fluid-tight seal between the docking receiver 48 and theresilient seal 58 can be achieved with a force that is less thanapproximately 1.00 psi. In non-exclusive alternative embodiments, theforce can be less than approximately 0.75, 0.50, 0.40 or 0.33 psi.Alternatively, the force can be greater than 1.00 psi or less than 0.33psi.

The fluid channel 60 can be a channel or other type of conduit for thefirst fluid 38 to move through the docking weight 56, in a directionfrom the first zone 26 toward the surface region 32. In one embodiment,the fluid channel 60 can be tubular and can have a substantiallycircular cross-section. Alternatively, the fluid channel 60 can haveanother suitable configuration. The positioning of the fluid channel 60within the docking weight 56 can vary. In one embodiment, the fluidchannel 60 can be generally centrally positioned within the dockingweight 56 so that the first fluid 38 flows substantially centrallythrough the docking weight 56. Alternatively, the fluid channel 60 canbe positioned in an off-center manner.

The docking apparatus 50 can be lowered into the well 12 from thesurface region 32. In certain embodiments, the docking apparatus 50utilizes the force of gravity to move down the riser pipe 30, throughany fluid present in the riser pipe 30 and into the engaged positionwith the docking receiver 48. Alternatively, the docking apparatus 50can be forced down the riser pipe 30 and into the engaged position byanother suitable means.

The docking apparatus 50 is moved from the engaged position to thedisengaged position by exerting a force on the docking apparatus 50against the force of gravity, such as by pulling in a substantiallyupward manner, e.g., in a direction from the docking receiver 48 towardthe surface region 32, on a tether or other suitable line coupled to thedocking apparatus 50 to break or otherwise disrupt the seal between theresilient seal 58 and the docking receiver 48.

The sensor assembly 51 senses one or more fluid properties in the firstfluid 38 or any other fluid in certain portions of the well 12. Thesensing of fluid properties by the sensor assembly 51 can be performedin situ, which can save time and/or the expense normally required forthe fluid purging process. Further, the sensor assembly 51 can transportor otherwise move the first fluid 38 or another fluid between pointswithin the well 12 and/or from the well 12 to outside of the well 12,such as to the controller 17, the fluid receiver 18, or other suitablelocations. The design of the sensor assembly 51 can vary to suit thedesign requirements of the fluid monitoring system 10.

In certain embodiments, the sensor assembly 51 includes a sensorapparatus 52 and a pump assembly 54. In the embodiment illustrated inFIG. 1, the pump assembly 54 operates to move the first fluid 38through, along or around the sensor apparatus 52, as described ingreater detail below. During this process, the sensor apparatus 52 cansense or otherwise determine one or more fluid properties of the firstfluid 38. These fluid properties can include, as non-exclusive examplesand without limitation, one or more of pressure, flow, refractive index,specific conductivity, temperature, oxidation-reduction potential, pH,dissolved oxygen, or any other suitable properties. In general terms,the fluid properties can include electrical properties, opticalproperties, acoustical properties, chemical properties and/or hydraulicproperties. As provided herein, the sensor apparatus can then transmitdata regarding the relevant fluid properties (sometimes referred toherein as “fluid property data”) to the controller 17 for furtherprocessing and/or analysis, as required.

Once the relevant fluid properties have been sensed by the sensorapparatus 52, the pump assembly 54 can pump the first fluid 38 to thecontroller 17, the fluid receiver 18 or to another region of the fluidmonitoring system 10, as required, In the embodiment illustrated in FIG.1 the sensor apparatus 52 is secured to the docking apparatus 50 andextends in a downwardly direction into the first zone 26 when thedocking apparatus 50 is in the engaged position. As provided previously,when the docking apparatus 50 is in the engaged position with thedocking receiver 48, the first zone 26 is isolated from the second zone28. Thus, because the sensor apparatus 52 is positioned within the firstzone 26, in the engaged position, the sensor apparatus 52 senses orotherwise monitors only the first fluid 38.

The sensor apparatus 52 has a length 62 that can be varied to suit thedesign requirements of the first zone 26 and the fluid monitoring system10. In certain embodiments, the sensor apparatus 52 extendssubstantially the entire length 43 of the fluid inlet structure 29.Alternatively, the length 62 of the sensor apparatus 52 can be anysuitable percentage of the length 43 of the fluid inlet structure 29.

The pump assembly 54 pumps the first fluid 38 that enters the pumpassembly 54 to the fluid receiver 18 via the fluid outlet line 20. Thedesign and positioning of the pump assembly 54 can vary. In oneembodiment, the pump assembly 54 is a highly robust, miniaturized lowflow pump that can easily fit into a relatively small diameter wells 12,such as a 1-inch or ¾-inch riser pipe 30, although the pump assembly 54is also adaptable to be used in larger diameter wells 12. Further, invarious embodiments, the pump assembly 54, including all of itscomponents, is completely removable from within the riser pipe 30 of thewell 12, as necessary.

In the embodiment illustrated in FIG. 1, the pump assembly 54 caninclude one or more one-way valves such as those found in a single valveparallel gas displacement pump, double valve pump, bladder pump,electric submersible pump and other types of pumps (not shown in FIG. 1)that are utilized during a parallel gas displacement pumping of thefirst fluid 38 to the fluid receiver 18. The one way valve(s) allow thefirst fluid 38 to move from the first zone 26 toward the fluid outletline 20, without the first fluid 38 moving in the opposite direction.These types of one-way valves can include poppet valves, reed valves,electronic and/or electromagnetic valves and check valves of anysuitable type and/or configuration, for example. The gas inlet line 16extends to the pump assembly 54, and the fluid outlet line 20 extendsfrom the pump assembly 54. In this embodiment, because the environmentalfluid level 42E is above the level of the sensor apparatus 52, the levelof the first fluid 38 equilibrates at a somewhat similar level withinthe fluid outlet line 20 (as well as the gas inlet line 16) as theenvironmental fluid level 42E, until such time as the first fluid 38 ispumped or otherwise transported toward the surface region 32.

As explained in greater detail below, gas 46 from the gas source 14 isdelivered down the gas inlet line 16 to the pump assembly 54 to forcethe first fluid 38 that has migrated to the pump assembly 54 duringequilibration upward through the fluid outlet line 20 to the fluidreceiver 18. With this design, the gas 46 does not cause anypressurization of the riser pipe 30, nor does the gas 46 utilize theriser pipe 30 during the pumping process. Stated another way, in thisand other embodiments, the riser pipe 30 does not form any portion ofthe pump assembly 54. With this design, the need for high-pressure riserpipe 30 is reduced or eliminated. Further, gas consumption is greatlyreduced because the riser pipe 30, which has a relatively large volume,need not be pressurized.

The pump assembly 54 can be coupled to the docking apparatus 50 so thatremoval of the docking apparatus 50 from the well 12 likewise results insimultaneous removal of the pump assembly 54 and/or the sensor apparatus52 from the well 12. In the embodiment illustrated in FIG. 1, as well asin other embodiments described herein, the docking apparatus 50, thesensor apparatus 52 and/or the pump assembly 54 are positioned“in-line”. As used herein, the term “in-line” is intended to beconstrued as structures being positioned in series, such that thestructures are positioned one beneath another relative in asubstantially vertical well 12, as illustrated in FIG. 1, for example.With this design, the sensor assembly 51 can be inserted into riserpipes 30 having smaller diameters, thereby reducing the volume of firstfluid 38 within the first zone 26 that may need to be purged from thewell 12, if required.

In operation, following installation of the well 12, fluid from theenvironment 11 enters the first zone 26 through the fluid inletstructure 29. Before the docking apparatus 50 is in the engagedposition, the first zone 26 and the second zone 28 are in fluidcommunication with one another, thereby allowing the fluid to flowupwards and mix into the second zone while the fluid level isequilibrating within the well 12.

During a monitoring, sampling or testing process, the docking apparatus50 is lowered into the well 12 down the riser pipe 30 until the dockingapparatus 50 engages with the docking receiver 48. The resilient seal 58forms a fluid-tight seal with the docking receiver 48 so that the firstzone 26 and the second zone 28 are no longer in fluid communication withone another. At this point the fluid within the well becomes separatedinto the first fluid 38 and the second fluid 40.

In the embodiment illustrated in FIG. 1, as the level of the first fluid38 rises, the sensor apparatus 52 begins receiving the first fluid 38.The sensor apparatus 52 can then begin determining relevant fluidproperties of the first fluid 38, and can transmit this data to thecontroller 17 for further processing, if necessary. In certainembodiments, the controller 17 is included as part of the sensorassembly 51. In these and other embodiments, the controller 17 cananalyze the data received from the sensor apparatus 52 to determinewhether removal of some or all of the first fluid 38 may desired orrequired, e.g., for further testing. If removal of the first fluid 38 isto be performed, the controller 17 can activate the pump assembly 54 atan appropriate time to commence removal of the first fluid 38 from thewell 12 or from the first zone 26, for example.

As the first fluid 38 continues to rise toward the pump assembly 54, thefirst fluid 38 remains isolated from the second fluid 40 because thepump assembly 54 is self-contained and does not rely on the riser pipe30 as part of the structure of the pump assembly 54. In other words, thefirst fluid 38 within the pump assembly 54 does not contact the secondfluid 40.

In certain embodiments, the controller 17 for an operator of the system)can commence the flow of gas 46 from the gas source 14 to the pumpassembly 54 to begin pumping the first fluid 38 through the fluid outletline 20 to the fluid receiver 18, as described in greater detail below.Once a suitable volume of the first fluid 38 has been pumped to thefluid receiver 18, the controller 17 can stop the flow of gas 46, whicheffectively stops the pumping process. The pump assembly 54 can thenrefill with more fluid from the environment 11 (via the first zone 26),which can then be monitored, analyzed and/or removed for further testingas needed. Alternatively, the first fluid 38 can be analyzed by thesensor apparatus 52 in situ in the first zone 26, without the need fortransporting the first fluid 38 through the fluid outlet line 20 to thefluid receiver 18. Alternatively, the process of purging the fluid canbe immediately followed by sampling and/or testing the fluid with thecontroller 17, for example.

Because the volume of the first zone 26 is relatively small incomparison with the volume of the second zone 28, purging of the firstfluid 38 from the first zone 26 can occur relatively rapidly. Further,because the first zone 26 is the sampling zone from which the firstfluid 38 is collected, there is no need to purge or otherwise remove anyof the second fluid 40 from the second zone 28. As long as the dockingapparatus 50 remains in the engaged position, any fluid entering thefirst zone 26 will not be substantially influenced by or diluted withthe second fluid 40.

FIG. 2 is a detailed cross-sectional view of one embodiment of a portionof the subsurface well 212, including a portion of the fluid inletstructure 229, a portion of the riser pipe 230 and the docking receiver248. In this embodiment, the docking receiver 248 is threadedly securedto the fluid inlet structure 229. Further, the riser pipe 230 isthreadedly secured to the docking receiver 248. The docking receiver 248is positioned between the fluid inlet structure 229 and the riser pipe230. In alternative embodiments, the fluid inlet structure 229, theriser pipe 230 and/or the docking receiver 248 can be secured to oneanother by a different mechanism, such as by an adhesive material,welding, or any other suitable engagement means. Still alternatively,the fluid inlet structure 229, the riser pipe 230 and/or the dockingreceiver 248 can be formed or molded as a unitary structure, which mayor may not include homogeneous materials.

The fluid inlet structure 229 has an outer diameter 264, the riser pipe230 has an outer diameter 266, and the docking receiver 248 has an outerdiameter 268. In this embodiment, the outer diameters 264, 266, 268 aresubstantially similar so that the outer casing of the well 212 has astandard form factor and is relatively uniform for easier installation.Alternatively, the outer diameters 264, 266, 268 can be different fromone another.

FIG. 3 is a schematic view of another embodiment of the fluid monitoringsystem 310. In FIG. 3, the environment 11 (illustrated in FIG. 1) andthe annular materials 24A-C (illustrated in FIG. 1) have been omittedfor simplicity. In the embodiment illustrated in FIG. 3, the fluidmonitoring system 310 includes components and structures that aresomewhat similar to those previously described, including the subsurfacewell 312, the gas source 314, the gas inlet line 316, the controller317, the fluid receiver 318, the fluid outlet line 320 and the zoneisolation assembly 322. However, in this embodiment, the pump assembly354 (described in greater detail below) of the zone isolation assembly322 includes two one-way valves including a first valve 382F and asecond valve 3828. The pump assembly 354 provides one or more advantagesover other types of pump assemblies as set forth herein.

FIG. 4 is a schematic diagram of a portion of one embodiment of thefluid monitoring system 410 including a gas source 414, a gas inlet line416, a controller 417, a fluid outlet line 420, a zone isolationassembly 422, and a pump assembly 454. The zone isolation assembly 422functions in a substantially similar manner as previously described.More specifically, the first zone 26 (illustrated in FIG. 1) is isolatedfrom the second zone 28 (illustrated in FIG. 1) so that the first fluid438 can migrate or be drawn through the sensor apparatus 52 (illustratedin FIG. 1) into the pump assembly 454 without mixing with or becomingdiluted by the second fluid 40 (illustrated in FIG. 1) in the secondzone 28.

The specific design of the pump assembly 454 can vary. In thisembodiment, the pump assembly 454 is a two-valve, two-line assembly. Thepump assembly 454 includes a pump chamber 484, a first valve 482F, asecond valve 482S, a portion of the gas inlet line 416 and a portion ofthe fluid outlet line 420. The pump chamber 484 can encircle one or moreof the valves 482F, 4825 and/or portions of the lines 416, 420.

The first valve 482F is a one-way valve that allows the first fluid(represented by arrow 438) to migrate or otherwise be transported fromthe first zone 26 into the pump housing 484. For example, the firstvalve 482F can be a check valve or any other suitable type of one-wayvalve that is open as the well fluid level 42W (illustrated in FIG. 1)equilibrates with the environmental fluid level 42E (illustrated in FIG.1). As the level of the first fluid 438 rises, the first valve 482F isopen, allowing the first fluid 438 to pass through the first valve 482Fand into the pump chamber 484. However, if the level of the first fluid438 begins to recede, the first valve 482F closes and inhibits the firstfluid 438 from moving back into the first zone 26.

The second valve 482S can also be a one-way valve that operates byopening to allow the first fluid 438 into the fluid outlet line 420 asthe level of the first fluid 438 rises within the pump chamber 484 dueto the equilibration process described previously. However, any backpressure in the fluid outlet line 420 causes the second valve 4825 toclose, thereby inhibiting the first fluid 438 from receding from thefluid outlet line 420 back into the pump chamber 484.

In certain embodiments, the first fluid 438 within the fluid outlet line420 is systematically moved toward and into the fluid receiver 18(illustrated in FIG. 1). In FIG. 5, two different embodiments for movingthe first fluid 438 toward the fluid receiver 18 are illustrated. In thefirst embodiment, the first fluid 438 is allowed to equilibrate to aninitial fluid level 486 in both the gas inlet line 416 and the fluidoutlet line 420. The controller 417 (or an operator) then causes the gas446 from the gas source 414 to move downward in the gas inlet line 416to force the first fluid 438 to a second fluid level 488 in the gasinlet line 416. This force causes the first valve 482F to close, andbecause the first fluid 538 has nowhere else to move to, the first fluid438 forces the second valve 4828 to open to allow the first fluid 438 tomove in an upwardly direction in the fluid outlet line 420 to a thirdfluid level 490 in the fluid outlet line 420.

The gas source 414 is then turned off to allow the level of the firstfluid 438 in the gas inlet line 416 to equilibrate with theenvironmental fluid level 42E. The second valve 482S closes, inhibitingany change in the level of the first fluid 438 in the fluid outlet line420. Once the first fluid 438 in the gas inlet line 416 has equilibratedwith the environmental fluid level 42E, the process of opening the gassource 414 to move the gas 446 downward in the gas inlet line 416 isrepeated. Each such cycle raises the level of the first fluid 438 in thefluid outlet line 420 until a desired amount of the first fluid 438reaches the fluid receiver 18. The gas cycling in this embodiment can beutilized regardless of the time required for the first fluid 438 toequilibrate, but this embodiment is particularly suited toward arelatively slow equilibration process.

In the second embodiment illustrated in FIG. 4, a greater volume of gas446 is used following equilibration of the first fluid to the initialfluid level 486. Thus, in this embodiment, instead of maintaining thegas 446 within the gas inlet line 416 during each cycle, the gas source414 is opened until the first fluid 438 is forced downward, out of thegas inlet line 416 and downward in the pump chamber 484 to a fourthfluid level 492 within the pump chamber 484. As provided previously,when the gas 446 is forced downward into the pump chamber 484, the firstvalve 482F closes and the second valve 4825 opens. This allows the firstfluid 438 to move upward in the fluid outlet line 420 to a greaterextent during each cycle. The gas source 414 is then closed, the firstfluid within the pump chamber 484 and the gas inlet line 416equilibrates, and the cycle is repeated until the desired volume offirst fluid 438 is delivered to the fluid receiver 18. The cycling inthis embodiment can be utilized regardless of the time required for thefirst fluid 438 to equilibrate, but this embodiment is particularlysuited toward a relatively rapid equilibration process.

With these designs, because the gas 446 is cycled up and down within thegas inlet line 416 and or pump chamber 484, and no pressurization of theriser pipe 30 (illustrated in FIG. 1) is required, only a small volumeof gas 446 is consumed, and the gas 446 is thereby conserved. Further,in this embodiment, the gas 446 does not come into contact with thefirst fluid 438 in the fluid outlet line 420. Consequently, potentialVOC loss caused by contact between the gas 446 and the first fluid 438can be inhibited or eliminated.

FIG. 5 is a schematic view of another embodiment of a fluid monitoringsystem 510 including a subsurface well 512. In this embodiment, thesubsurface well 512 does not include the docking receiver 48(illustrated in FIG. 1) or the docking apparatus 50 (illustrated in FIG.1). Instead, as illustrated in FIG. 5, the subsurface well 512 includesa fluid inlet structure 529, a riser pipe 530 and a sensor assembly 551.

The sensor assembly 551 includes a sensor apparatus 552 and a pumpassembly 554 coupled to the sensor apparatus 552 in an in-line manner.Stated another way, in this embodiment, the pump assembly 554 ispositioned substantially directly between the sensor apparatus 552 andthe surface region 532 of the well 512 in a direction that moves betweenthe sensor apparatus 552 and the surface region 532 of the well 512. Inone such embodiment, the sensor apparatus 552, the pump assembly 554 andthe surface region 532 of the well 512 are arranged in a substantiallycollinear manner. It is recognized, however, that not all wells 512 areabsolutely linear in configuration. For instance, some wells 512 caninclude riser pipes 530 that curve or bend. It is to be understood thatas used herein, the term “in-line” is intended to be construed asconsecutive or in series with one another, With this in-line design, thesensor assembly 551 can be positioned in wells 512 having relativelysmall inner diameters 544, i.e. less than approximately 1.50 inches,less than approximately 1.00 inches, or less than approximately 0.75inches, as non-exclusive examples.

In one embodiment, the sensor assembly 551 is positioned at or below thewell fluid level 542W. However, in alternative embodiments, only aportion of the sensor assembly 551 is positioned at or below the wellfluid level 542W. For example, in one embodiment, the entire sensorapparatus 552 and only a portion of the pump assembly 554 are positionedbelow the well fluid level 542W. In still other embodiments, one of thesensor assembly 552 and the pump assembly 554 are positioned below thewell fluid level 542W, while the other of the sensor assembly 552 andthe pump assembly 554 is positioned entirely above the well fluid level542W. In yet another embodiment, only a portion of one of the sensorapparatus 552 and the pump assembly 554 is positioned below the wellfluid level 542W, while the other of the sensor apparatus 552 and thepump assembly 554 is positioned entirely above the well fluid level542W.

In various embodiments, the activation of the pump assembly 554 drawsfluid through the sensor apparatus 552 for determining one or more fluidproperties of the fluid. In other embodiments, the pump assembly 554 canpump fluid through the sensor apparatus 552 for determining one or morefluid properties of the fluid, as described in greater detail below, Thepump assembly 554 can pump the fluid only to the extent of moving atleast partially through the sensor apparatus 552, or the pump assembly554 can pump the fluid through the sensor apparatus 552 and further tothe fluid receiver 518, Alternatively, the pump assembly 554 can pumpthe fluid through the sensor apparatus 552 and further to anotherstructure of the fluid monitoring system 510.

In one embodiment, the sensor apparatus 552 has an apparatus housing 570having one or more housing inlets 572 (only one housing inlet 572 isillustrated in FIG. 5), and one or more housing outlets 574 (only onehousing outlet 574 is illustrated in FIG. 5). Each housing inlet 572receives fluid into the apparatus housing 570 of the sensor apparatus552, Once inside the apparatus housing 570, the fluid is either drawn,pushed or passively moves through the apparatus housing 570 toward thehousing outlet 574. During movement of the fluid through the apparatushousing 570, one or more fluid properties are measured, sensed orotherwise determined, as explained in greater detail below.

Further, in this embodiment, the sensor assembly 551 can include a firstconduit 576 and/or a second conduit 578. The first conduit 576 extendsdirectly between the sensor apparatus 552 and the pump assembly 554. Thefirst conduit 576 guides movement of the fluid between the sensorapparatus 552 and the pump assembly 554.

In the embodiment illustrated in FIG. 5, the second conduit 578 canextend between the sensor apparatus 552 and the controller 517 or otherstructure within or outside of the well 512. In this embodiment, thesecond conduit 578 can guide positioning of one or more signaltransmitters (not shown), such as wires, cables, bundles, electrodes,sensors, fiber optics, etc., which can carry data or other signals tothe controller 517 for processing.

In an alternative embodiment, only the first conduit 576 is used. Inthis embodiment, the fluid and the one or more signal transmitters canmove, can be positioned, or can otherwise cohabitate within the firstconduit 576, at least between the sensor apparatus 552 and the pumpassembly 554. In still another embodiment, no conduit is used to guidepositioning of the signal transmitter(s) between the sensor apparatus552 and the pump assembly 554.

The pump assembly 554 can include any suitable type of pump. In theembodiment illustrated in FIG. 5, the pump assembly 554 can include atwo line, two valve pump described previously herein, Alternatively, thepump assembly 554 can include a single valve parallel gas displacementpump, double valve pump, bladder pump, electric submersible pump and/orany other suitable type of pump.

FIG. 6 is a cross-sectional view of the fluid inlet structure 529 andthe sensor apparatus 552 taken on line 6-6 in FIG. 5. In thisembodiment, the fluid travels through the sensor apparatus 552 via theapparatus inlet 572 (illustrated in FIG. 5), through one or more housingchannels 680 (only one housing channel is present in the embodimentillustrated in FIG. 6) to the apparatus outlet 574 (illustrated in FIG.5). The size and or positioning of the housing channels 680 can vary tosuit the design requirements of the fluid monitoring system 10.

The sensor apparatus 552 includes one or more sensors 682 that sense orotherwise determine one or more fluid properties of the fluid and/orcollect data relative to one or more fluid properties of the fluid,which can then be sent, relayed or otherwise transmitted to thecontroller 517 (illustrated in FIG. 5) for further processing, ifrequired. The specific type of sensor(s) 682 included in the sensorapparatus can vary depending upon the requirements of the sensorassembly 551 (illustrated in FIG. 5) and/or the fluid monitoring system10. For example, the sensor(s) 682 can include a series of electrodes,with each electrode being calibrated to sense a different fluid propertyof the fluid. In non-exclusive alternative embodiments, the sensor 682can include a polymeric coded Fiber Bragg Grating sensor, an array ofsensor filaments, an array of fiber optic nodes such as a fiber opticcable, or any other suitable type of sensor known to those skilled inthe art. As the fluid passes through the housing channel 680, the fluidcan come near and/or contact the sensor 682 as required by the sensor682.

In one embodiment, because the fluid properties are sensed in situ, thesensor assembly 551 can be dynamically raised or lowered within the well512 (illustrated in FIG. 5) as needed to test or compile relevant dataregarding various fluid properties for fluid at specific locations ordepths within the well 512. As a result, time can be saved because thefluid does not necessarily need to be transported to the fluid receiver518 for analysis of specific fluid properties. Alternatively, the fluidcan be transported to the fluid receiver for analysis.

FIG. 7 is a cross-sectional view of a fluid inlet structure 729 andanother embodiment of a sensor apparatus 752. In this embodiment, thesensor apparatus 752 can include a plurality of housing channels 780,with one or more sensors 782 residing within each housing channel 780.In one such embodiment, each housing channel 780 can include a distincttype of sensor that senses one particular fluid property of the fluid tobe tested. Alternatively, a plurality of the same type of sensor can beused in order to cross-check the accuracy of the other similar sensorsand/or compile a greater amount of data relative to one or more specificfluid properties. The plurality of housing channels 780 can remainseparated throughout the sensor apparatus 752, or a plurality or all ofthe housing channels 780 can converge and merge into a single housingchannel 780 as the housing channels 780 approach the housing outlet 574(illustrated in FIG. 5, for example).

FIG. 8 is a schematic view of another embodiment of a fluid monitoringsystem 810 including a subsurface well 812. In this embodiment, thesubsurface well 812 includes a fluid inlet structure 829, a riser pipe830 and a sensor assembly 851. The sensor assembly 851 includes a sensorapparatus 852 and a pump assembly 854 coupled to the sensor apparatus852 in an in-line manner. In this embodiment, the sensor apparatus 852is positioned substantially directly between the pump assembly 854 andthe surface region 832 of the well 812 in a direction that moves betweenthe sensor apparatus 852 and the surface region 832 of the well 812. Inone such embodiment, the pump assembly 854, the sensor apparatus 852 andthe surface region 832 of the well 812 are arranged in a substantiallycollinear manner. With this in-line design, the sensor assembly 851 canbe positioned in wells 812 having relatively small inner diameters 844,i.e. less than approximately 1.50 inches, less than approximately 1.00inches, or less than approximately 0.75 inches, as non-exclusiveexamples.

In this embodiment, rather than the fluid being drawn into the sensorapparatus 852, activation of the pump assembly 854 pushes or pumps fluidthrough the sensor apparatus 852. The pump assembly 854 can pump thefluid only to the extent of moving at least partially through the sensorapparatus 852, or the pump assembly 854 can pump the fluid through thesensor apparatus 852 and further to the fluid receiver 818.Alternatively, the pump assembly 854 can pump the fluid through thesensor apparatus 882 and further to another structure of the fluidmonitoring system 810, as required by the system 810.

Further, in this embodiment, fluid monitoring system 810 includes a gasinlet line 816 similar to that described previously herein. However, inthis embodiment, the gas inlet line 816 can either be positioned totravel through the sensor apparatus 852, or to bypass or detour aroundthe sensor apparatus 852.

In one embodiment, the entire sensor assembly 851 is positioned at orbelow the well fluid level 842W. However, in the embodiment illustratedin FIG. 8, only the pump assembly 854 is positioned at or below the wellfluid level 842W. Because the pump assembly 854 is effectively pushingthe fluid to the sensor apparatus 852, the sensor apparatus 852 does notneed to be fully or even partially submerged below the well fluid level842W to receive the fluid for sensing. Once the fluid has been sensedwith the sensor apparatus 852, the sensor apparatus 852 can transmitfluid property data to the controller 817 for further processing and/oranalysis, as required by the fluid monitoring system 810. With thisdesign, the sensor apparatus 852 can be positioned at or near thesurface region 832 for easier accessibility, for example. Alternatively,the sensor apparatus 852 can be positioned near the pump assembly 854.

It is recognized that the various embodiments illustrated and describedherein are representative of various combinations of features that canbe included in the fluid monitoring system 10 and/or the zone isolationassemblies 22 and/or the sensor assemblies 51. However, numerous otherembodiments have not been illustrated and described as it would beimpractical to provide all such possible embodiments herein. It is to beunderstood that an embodiment of the sensor assembly 51, for example,can combine the sensor apparatus 52 and the pump assembly 54 within asingle housing structure, as opposed to separate housing structures foreach of the sensor apparatus 52 and the pump assembly 54 within the well12. No limitations are intended by not specifically illustrating anddescribing any particular embodiment.

While the particular fluid monitoring systems 10 and sensor assemblies51 as herein shown and disclosed in detail are fully capable ofobtaining the objects and providing the advantages herein before stated,it is to be understood that they are merely illustrative of variousembodiments of the invention. No limitations are intended to the detailsof construction or design herein shown other than as described in theappended claims.

What is claimed is:
 1. A fluid monitoring system for monitoring one or more fluid properties of a fluid in a subsurface well having a well fluid level, the subsurface well including a surface region and a riser pipe that extends in a generally downward direction from the surface region, the fluid monitoring system comprising: a sensor apparatus that is positioned within the subsurface well, the sensor apparatus being configured to sense the one or more fluid properties of the fluid; and a pump assembly that is positioned nearer to the surface region than the sensor apparatus within the subsurface well, the pump assembly being mechanically connected to and spaced apart from the sensor apparatus, the pump assembly being configured to move the fluid along the sensor apparatus, the pump assembly moving the fluid toward the surface region.
 2. The fluid monitoring system of claim 1 wherein the pump assembly is positioned in an inline manner with the sensor apparatus.
 3. The fluid monitoring system of claim 1 wherein at east a portion of the pump assembly is positioned below the well fluid level within the subsurface well.
 4. The fluid monitoring system of claim 1 wherein the sensor apparatus includes a sensor that is configured to sense the one or more fluid properties of the fluid.
 5. The fluid monitoring system of claim 4 wherein the pump assembly is adapted to draw fluid from outside the sensor apparatus to proximate the sensor so that the sensor can sense the one or more of the fluid properties of the fluid.
 6. The fluid monitoring system of claim 4 wherein the sensor apparatus includes an apparatus housing having a housing inlet and a housing outlet, and wherein the sensor is positioned substantially within the apparatus housing between the housing inlet and the housing outlet.
 7. The fluid monitoring system of claim 1 wherein the pump assembly includes one of a two-line, two-valve pump, an electric submersible pump and a bladder pump.
 8. The fluid monitoring system of claim 1 wherein the sensor apparatus includes a Fiber Bragg Grating sensor.
 9. The fluid monitoring system of claim 1 further comprising a controller that receives data from the sensor apparatus regarding one of the fluid properties of the fluid while the sensor apparatus is positioned within the subsurface well.
 10. The fluid monitoring system of claim 9 wherein the controller is positioned outside of the riser pipe of the subsurface well.
 11. The fluid monitoring system of claim 1 wherein one of the fluid properties is selected from the group consisting of an electrical property, an optical property, an acoustical property, a chemical property and a hydraulic property.
 12. The fluid monitoring system of claim 1 further comprising a conduit that couples the sensor apparatus to the pump assembly, the conduit being configured to guide movement of the fluid between the sensor apparatus and the pump assembly.
 13. A fluid monitoring system for monitoring one or more fluid properties of a fluid in a subsurface well having a well fluid level, the subsurface well including a surface region and a riser pipe that extends in a generally downward direction from the surface region, the fluid monitoring system comprising: a sensor apparatus that is positioned within the subsurface well, the sensor apparatus being configured to sense the one or more fluid properties of the fluid; a pump assembly that is positioned nearer to the surface region than the sensor apparatus within the subsurface well, the pump assembly being configured to move the fluid along the sensor apparatus, the pump assembly moving the fluid toward the surface region; and a conduit that couples the sensor apparatus to the pump assembly, the conduit being configured to guide movement of the fluid between the sensor apparatus and the pump assembly.
 14. The fluid monitoring system of claim 13 wherein the pump assembly is spaced apart from the sensor apparatus.
 15. The fluid monitoring system of claim 13 wherein the pump assembly is positioned in an inline manner with the sensor apparatus.
 16. The fluid monitoring system of claim 13 wherein the sensor apparatus includes a sensor, and the pump assembly is adapted to draw fluid from outside the sensor apparatus to proximate the sensor so that the sensor can sense the one or more of the fluid properties of the fluid.
 17. The fluid monitoring system of claim 13 wherein at least a portion of the pump assembly is positioned below the well fluid level within the subsurface well.
 18. The fluid monitoring system of claim 13 further comprising a controller that receives data from the sensor apparatus regarding one of the fluid properties of the fluid while the sensor apparatus is positioned within the subsurface well.
 19. The fluid monitoring system of claim 13 wherein one of the fluid properties is selected from the group consisting of an electrical property, an optical property, an acoustical property, a chemical property and a hydraulic property.
 20. A fluid monitoring system for monitoring one or more fluid properties of a fluid in a subsurface well having a well fluid level, the subsurface well including a surface region and a riser pipe that extends in a generally downward direction from the surface region, the fluid monitoring system comprising: a sensor apparatus that is positioned within the subsurface well, the sensor apparatus including a sensor that is configured to sense the one or more fluid properties of the fluid; a pump assembly that is positioned nearer to the surface region than the sensor apparatus within the subsurface well, the pump assembly being mechanically connected to and spaced apart from the sensor apparatus, the pump assembly being positioned in an inline manner with the sensor apparatus, the pump assembly being configured to move the fluid along the sensor apparatus, the pump assembly moving the fluid toward the surface region; a conduit that couples the sensor apparatus to the pump assembly, the conduit being configured to guide movement of the fluid between the sensor apparatus and the pump assembly; and a controller that receives data from the sensor apparatus regarding one of the fluid properties of the fluid while the sensor apparatus is positioned within the subsurface well. 